Patent details

EP2681623 Title: PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM

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Basic Information

Publication number:
EP2681623
WO Application Number:
JP2012055298
Type:
European Patent Granted for NL
Status:
Deemed not to be granted according to art. 52.4a or 52.6 ROW
Publication Title:
Title When Made Available For Viewing:
Reason Lapsed:
Application number:
EP12752967.5
WO Publication Number:
WO2012118168
EPO Publication Language:
English
SPC Number:
First Applicant Residence Country:
Japan (JP)
Publications:

Dates

Filing date:
24/02/2012
Grant date:
10/07/2019
EP Publication Date:
08/01/2014
WO Publication Date:
07/09/2012
Claims Translations Received Date:
Claims Translation B1 Received Date:
Claims Translation B2 Received Date:
Claims Translation B3 Received Date:
Lapsed By Non Payment Annual Fee Date:
Renunciation Date:
NullificationDate:
Published:
Due To Cession Date:
Registration date:
10/07/2019
EP B1 Publication Date:
10/07/2019
EP B2 Publication Date:
EP B3 Publication Date:
Description Translation B1 Received Date:
Description Translation B2 Received Date:
Description Translation B3 Received Date:
Expiration date:
23/02/2032
Lapsed By Expiration Date:
Revocation Date:
Invalidity Date:
10/07/2019
Response To Novelty Search Report Received:
Patent Granting Request:
Lapsed date:

Applicant/holder

From:
10/07/2019
 
 

 

Name:
FUJIFILM Corporation
Address:
26-30, Nishiazabu 2-chome Minato-ku, TOKYO 106-0031, Japan (JP)

Inventor

1

Name:
TAKAHASHI, Hidenori
Address:
Shizuoka, Japan (JP)

2

Name:
YAMAGUCHI, Shuhei
Address:
Shizuoka, Japan (JP)

3

Name:
KATAOKA, Shohei
Address:
Shizuoka, Japan (JP)

4

Name:
SHIRAKAWA, Michihiro
Address:
Shizuoka, Japan (JP)

5

Name:
YOSHINO, Fumihiro
Address:
Shizuoka, Japan (JP)

6

Name:
SAITOH, Shoichi
Address:
Shizuoka, Japan (JP)

Priority

1

Priority Patent Number:
2012035633
Priority Date:
21/02/2012
Priority Country:
Japan (JP)

2

Priority Patent Number:
2011177257
Priority Date:
12/08/2011
Priority Country:
Japan (JP)

3

Priority Patent Number:
2011043321
Priority Date:
28/02/2011
Priority Country:
Japan (JP)

4

Priority Patent Number:
201161447258 P
Priority Date:
28/02/2011
Priority Country:
United States of America (US)

Classification

IPC or IDT classification:
G03F 7/004; G03F 7/038; G03F 7/039; G03F 7/11; G03F 7/20; G03F 7/32; G03F 7/40;

Publication

Bulletin

1

Bulletin Heading:
VRV
Journal edition number:
46/19
Publication date:
13/11/2019
Description:
Lapse or annulment

2

Bulletin Heading:
EP2
Journal edition number:
28/19
Publication date:
10/07/2019
Description:
European patents granted for the Netherlands

European Patent Bulletin

Issue number:
201928
Publication date:
10/07/2019
Description:
Grant (B1)

Annual Fee

Annual Fee(s) Due Date:
Annual Fee Number:
Last Annual Payment Date:
Last Annual Fee Paid Number:
Payer:
Filing date Document type Document Description Number of pages File Type