Patent details
EP2666057 Title: CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
The time of generation of the report may vary depending on the number of the selected files and the pages of each file. If the generation of the consolidated PDF file takes long, you may reduce the number of selected files and proceed with the generation of the PDF in batches.
You have not selected any documents
Basic Information
- Publication number:
- EP2666057
- WO Application Number:
- JP2011080549
- Type:
- European Patent Granted for NL
- Status:
- Deemed not to be granted according to art. 52.4a or 52.6 ROW
- Publication Title:
- Title When Made Available For Viewing:
- Reason Lapsed:
- Application number:
- EP11856421.0
- WO Publication Number:
- WO2012098822
- EPO Publication Language:
- English
- SPC Number:
- First Applicant Residence Country:
- Japan (JP)
- Publications:
Dates
- Filing date:
- 22/12/2011
- Grant date:
- 28/07/2021
- EP Publication Date:
- 27/11/2013
- WO Publication Date:
- 26/07/2012
- Claims Translations Received Date:
- Claims Translation B1 Received Date:
- Claims Translation B2 Received Date:
- Claims Translation B3 Received Date:
- Lapsed By Non Payment Annual Fee Date:
- Renunciation Date:
- NullificationDate:
- Published:
- Due To Cession Date:
- Registration date:
- 28/07/2021
- EP B1 Publication Date:
- 28/07/2021
- EP B2 Publication Date:
- EP B3 Publication Date:
- Description Translation B1 Received Date:
- Description Translation B2 Received Date:
- Description Translation B3 Received Date:
- Expiration date:
- 21/12/2031
- Lapsed By Expiration Date:
- Revocation Date:
- Invalidity Date:
- 28/07/2021
- Response To Novelty Search Report Received:
- Patent Granting Request:
- Lapsed date:
Applicant/holder
- From:
- 28/07/2021
- Name:
- FUJIFILM Corporation
- Address:
- 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 106-8620, Japan (JP)
Inventor
1
- Name:
- TSUCHIMURA, Tomotaka
- Address:
- Haibara-gun, Shizuoka, Japan (JP)
2
- Name:
- YATSUO, Tadateru
- Address:
- Haibara-gun, Shizuoka, Japan (JP)
Priority
1
- Priority Patent Number:
- 2011255302
- Priority Date:
- 22/11/2011
- Priority Country:
- Japan (JP)
2
- Priority Patent Number:
- 2011008331
- Priority Date:
- 18/01/2011
- Priority Country:
- Japan (JP)
3
- Priority Patent Number:
- 201161504431 P
- Priority Date:
- 05/07/2011
- Priority Country:
- United States of America (US)
Classification
- IPC or IDT classification:
- C08F 12/24; G03F 7/038; G03F 7/039;
Publication
Bulletin
1
- Bulletin Heading:
- VRV
- Journal edition number:
- 48/21
- Publication date:
- 01/12/2021
- Description:
- Lapse or annulment
2
- Bulletin Heading:
- EP2
- Journal edition number:
- 30/21
- Publication date:
- 28/07/2021
- Description:
- European patents granted for the Netherlands
European Patent Bulletin
- Issue number:
- 202130
- Publication date:
- 28/07/2021
- Description:
- Grant (B1)
Annual Fee
- Annual Fee(s) Due Date:
- Annual Fee Number:
- Last Annual Payment Date:
- Last Annual Fee Paid Number:
- Payer:
| Filing date | Document type | Document Description | Number of pages | File Type |
|---|