EP2428541
Title:
Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
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Basic Information
Publication number:
EP2428541
WO Application Number:
Type:
European Patent Granted for NL
Status:
Deemed not to be granted according to art. 52.4a or 52.6 ROW
Publication Title:
Title When Made Available For Viewing:
Reason Lapsed:
Application number:
EP11179985.4
WO Publication Number:
EPO Publication Language:
English
SPC Number:
First Applicant Residence Country:
Germany (DE)
Publications:
Dates
Filing date:
05/09/2011
Grant date:
06/03/2019
EP Publication Date:
14/03/2012
WO Publication Date:
Claims Translations Received Date:
Claims Translation B1 Received Date:
Claims Translation B2 Received Date:
Claims Translation B3 Received Date:
Lapsed By Non Payment Annual Fee Date:
Renunciation Date:
NullificationDate:
Published:
Due To Cession Date:
Registration date:
06/03/2019
EP B1 Publication Date:
06/03/2019
EP B2 Publication Date:
EP B3 Publication Date:
Description Translation B1 Received Date:
Description Translation B2 Received Date:
Description Translation B3 Received Date:
Expiration date:
04/09/2031
Lapsed By Expiration Date:
Revocation Date:
Invalidity Date:
06/03/2019
Response To Novelty Search Report Received:
Patent Granting Request:
Lapsed date:
Applicant/holder
From:
06/03/2019
Name:
BASF SE
Address:
Carl-Bosch-Strasse 38, 67056 Ludwigshafen am Rhein, Germany (DE)
Inventor
1
Name:
Li, Yuzhuo
Address:
69123 Heidelberg, Germany (DE)
2
Name:
Chu, Jea-Ju
Address:
Shilin District, Taipei City 111, Taiwan, Chinese Taipei (TW)
3
Name:
Venkataraman, Shyam Sundar
Address:
Zhongli City
Taoyuan County 320, Taiwan, Chinese Taipei (TW)